Cluster-type PE-CVD System CME-200E/400

Cluster-type PE-CVD System

CME-200E/400

CME-200E/400 is the most suitable model in the PE-CVD series production system for deposition of Si films with application as Insulator or barrier layers.

 

features

  • High-density plasma process with high-frequency(27.12 MHz) power supply.
  • High-quality film using SiH4 precursor: SiO2, SiNx, SiON, a-Si, also for TEOS process for SiO2 film.
  • Chamber Cleaning with NF3+Ar plasma.
  • Supports the heater for low-temperature deposition of organic EL.
  • Substrate size up to 200 x 200mm for CME-200E, Max. 300 x 400mm for CME-400.

Applications

  • Power device
  • LED, LD, High-speed device
  • Organic LED
  • Solar cell
  • MEMS
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